专利名称：Material, particularly for an optical
component for use in microlithography, andmethod for making a blank from thematerial
发明人：Bodo Kuehn,Stefan Ochs申请号：US11788007申请日：20070418
公开号：US20070248522A1公开日：20071025
摘要：The invention is concerned with a material which shows low absorption for UVradiation having a wavelength below 250 nm, low birefringence, high chemical resistanceand high radiation resistance and which is therefore particularly usable for Making opticalcomponents for microlithography. According to the invention the material consists ofsynthetically produced quartz crystallites which form a polycrystalline structure and havea mean grain size in the range between 500 nm and 30 μm. The method according to theinvention for making a blank from the material comprises providing granules consistingof synthetically produced quartz crystals having a mean grain size in the range between500 nm and 30 μm, and sintering the granules to obtain a blank of polycrystalline quartz.
申请人：Bodo Kuehn,Stefan Ochs
地址：Gelnhausen DE,Bad Camberg DE
国籍：DE,DE
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