Impact-resistant composition based on a polyamide

专利名称：Impact-resistant composition based on a

polyamide resin and on a blend of at leastone graft copolymer with polyamide blocksand a low-density ethylene polymer

发明人：Marius Hert,Alain Bouilloux,Thibaut

Montanari,Thomas Fine

申请号：US12445082申请日：20071011公开号：US08410216B2公开日：20130402

摘要：The invention relates to a composition based on an impact-resistant

thermoplastic polyamide resin, comprising, as a blend—from 60 to 98 wt % of polyamideresin (A) and—from 2 to 40 wt % of a blend of at least one graft copolymer withpolyamide blocks (B) composed of a polyolefin backbone and at least one polyamidegraft in which the grafts are attached to the backbone by the residues of an unsaturatedmonomer (X) having a functional group capable of reacting with an amine-terminatedpolyamide, the residues of the unsaturated monomer (X) being attached to the backboneby grafting or copolymerization via its double bond, and of a non-reactive ethylenicpolymer (C) that is miscible with (B) and has a density of below 0.960 g/cm.

申请人：Marius Hert,Alain Bouilloux,Thibaut Montanari,Thomas Fine

地址：Epfig FR,Saint-Leger de Rotes FR,Menneval FR,Lyons FR

国籍：FR,FR,FR,FR

代理机构：Buchanan Ingersoll & Rooney

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